Wafer Inspection - Monitoring And Testing Information

Articles & Whitepapers

Teron SL670e and Teron SL670e XP: EUV Reticle Quality Control

Extreme ultraviolet (EUV) lithography is a key technology inflection for the semiconductor industry. While shifting the scanner wavelength to EUV has enabled printing of the smaller pattern features required for ≤5nm design node chips, it has also added tremendous complexity to the equipment, reticles, resists and other infrastructure required to support EUV lithography. New defect mechanisms ...

What is an Aspheric Lens?

Aspheric lenses (or more simply, aspheres) are used in a wide variety of applications as a way to optimize optical performance while ensuring an efficient design. They are characterized by a radius ...

Aerosol Particle Monitoring Inside of Semiconductor Process Tools

Introduction Contamination poses a significant threat to semiconductor manufacturing processes, impacting yield and revenue. This blog explores the pivotal role of real-time aerosol particle monitoring in semiconductor manufacturing, specifically ...

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Semiconductor Wafer Stress Measurement

Faced with the increasing complexity of semiconductor manufacturing processes, IDMs and foundries rely on high performance production-worthy transparent film metrology for fabwide process control. Metrosemi’s MetroStress 101 of metrology systems deliver superior measurement accuracy, repeatability and tool-to-tool matching on a highly reliable and flexible platform. Utilizing ...