Atomic Layer Deposition Science - Monitoring And Testing Information

Articles & Whitepapers

What is important when selecting an ozone generator for your ALD

Some time ago, a Semiconductor manufacturer approached us with a concern. They explained that their current ozone generator was not sufficient for effectively treating their substrate, resulting in a lengthy process and that they require a larger ozone generator. At Absolute Ozone®, we provide free and unlimited support to all our clients for their applications so to better understand the ...

The Basics of Process Gas Analysis in Chemical Vapor Deposition

Chemical vapor deposition (CVD) processes rely on process gases for the transport of volatile precursors and byproducts. Performing process gas analysis on exhaust streams in CVD applications ...

New Presentation: Analytic Methods for ALD Technologies

Dr. Dane Walker from Hiden Analytical recently presented at the 7th International Conference “ALD FOR INDUSTRY” on Tuesday, March 12, 2024, during the Tutorial, Workshop & Industrial Exhibition segment. This distinguished event aims ...

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Atomic Layer Deposition (Atomic-Classic)

Substrate Size : 4 ~ 8” Standard (Wafer). Thermal ALD Process. Laminar Gas Flow (Side Gas Flow). Gas Delivery System : Bubbler, LDS etc. Low Particle Generation. Small Volume for Process. Available Laminated & Mixed Process. Easy User Interface & Maintenance. Max Temperature : 450 ? (@ Wafer). No. of Precursor Canisters : Up to 4 Sets (Standard).